US 12,264,275 B2
Treatment liquid
Kohei Hayashi, Haibara-gun (JP); and Tomonori Takahashi, Haibara-gun (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Aug. 23, 2022, as Appl. No. 17/893,303.
Claims priority of application No. 2021-143129 (JP), filed on Sep. 2, 2021.
Prior Publication US 2023/0101156 A1, Mar. 30, 2023
Int. Cl. C09K 13/06 (2006.01); C09K 13/08 (2006.01); C11D 1/65 (2006.01); C11D 1/00 (2006.01); C11D 1/62 (2006.01); C11D 3/04 (2006.01); C11D 3/39 (2006.01); H01L 21/02 (2006.01)
CPC C09K 13/06 (2013.01) [C09K 13/08 (2013.01); C11D 1/65 (2013.01); C11D 1/008 (2013.01); C11D 1/62 (2013.01); C11D 3/042 (2013.01); C11D 3/3942 (2013.01); C11D 2111/22 (2024.01); H01L 21/02057 (2013.01)] 18 Claims
 
1. A treatment liquid comprising:
water;
a cationic compound;
an anionic compound selected from the group consisting of a resin having a carboxy group or a salt thereof, a resin having a sulfo group or a salt thereof, a resin having a phosphorous acid group or a salt thereof, and a resin having a phosphoric acid group or a salt thereof, and
an oxidizing agent,
wherein the cationic compound includes a compound having a structure represented by Formula (3-4),

OG Complex Work Unit Chemistry
in Formula (3-4), * represents a bonding position,
wherein the treatment liquid has a pH of 7.0 or less, and
the treatment liquid is substantially free of abrasive grains.