	US 12,264,265 B2
	Concentrated liquid of polishing composition and polishing method using same
Yoshihiro Izawa, Aichi (JP)
Assigned to FUJIMI INCORPORATED, Aichi (JP)
Filed by FUJIMI INCORPORATED, Aichi (JP)
Filed on Jun. 10, 2021, as Appl. No. 17/343,944.
Claims priority of application No. 2020-105176 (JP), filed on Jun. 18, 2020.
Prior Publication US 2022/0025213 A1, Jan. 27, 2022
Int. Cl. C09G 1/02 (2006.01); B24B 19/22 (2006.01); H05K 3/26 (2006.01)

CPC C09G 1/02 (2013.01) [B24B 19/22 (2013.01); H05K 3/26 (2013.01)]

16 Claims

1. A concentrated liquid of a polishing composition comprising:

particulate alumina;

colloidal alumina having an aspect ratio of more than 5 and 800 or less;

at least one phosphorus-containing acid selected from the group consisting of phosphoric acid, phosphoric acid condensates, organic phosphoric acids, phosphonic acids, and organic phosphonic acids; and

water

wherein a pH of the concentrated liquid of the polishing composition is 2 or more and 4.5 or less, and

wherein a shape of the colloidal alumina is feathery.