US 12,264,168 B2
Ruthenium compound, thin-film forming raw material, and method of producing thin film
Masaki Enzu, Tokyo (JP); Masako Hatase, Tokyo (JP); and Keisuke Takeda, Tokyo (JP)
Assigned to ADEKA CORPORATION, Tokyo (JP)
Appl. No. 17/620,934
Filed by ADEKA CORPORATION, Tokyo (JP)
PCT Filed Jun. 10, 2020, PCT No. PCT/JP2020/022828
§ 371(c)(1), (2) Date Dec. 20, 2021,
PCT Pub. No. WO2020/255822, PCT Pub. Date Dec. 24, 2020.
Claims priority of application No. 2019-115184 (JP), filed on Jun. 21, 2019.
Prior Publication US 2022/0372056 A1, Nov. 24, 2022
Int. Cl. C07F 15/00 (2006.01); C23C 16/18 (2006.01)
CPC C07F 15/0046 (2013.01) [C23C 16/18 (2013.01)] 3 Claims
 
1. A ruthenium compound represented by the following general formula (2):

OG Complex Work Unit Chemistry
where R13 and R15 represent hydrogen atoms, and R14, R16 and R17 represent methyl groups.