US 12,264,075 B2
Composition for forming silica layer and silica layer
Jin-Hee Bae, Suwon-si (KR); Taeksoo Kwak, Suwon-si (KR); Myungho Kang, Suwon-si (KR); Seungwoo Jang, Suwon-si (KR); and Kunbae Noh, Suwon-si (KR)
Assigned to Samsung SDI Co., Ltd., Yongin-si (KR)
Filed by Samsung SDI Co., Ltd., Yongin-si (KR)
Filed on Aug. 7, 2020, as Appl. No. 16/987,981.
Claims priority of application No. 10-2019-0102596 (KR), filed on Aug. 21, 2019.
Prior Publication US 2021/0053832 A1, Feb. 25, 2021
Int. Cl. C01B 33/12 (2006.01); C09D 1/00 (2006.01); C09D 7/20 (2018.01); C23C 18/12 (2006.01); H01L 27/12 (2006.01)
CPC C01B 33/126 (2013.01) [C09D 1/00 (2013.01); C09D 7/20 (2018.01); C23C 18/122 (2013.01); H01L 27/1248 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A composition for forming a silica layer, the composition comprising:
a silicon-containing polymer; and
a solvent,
wherein the silicon-containing polymer is an inorganic polysilazane,
wherein the inorganic polysilazane has a weight average molecular weight of 8,600 g/mol to 13,000 g/mol;
wherein the solvent is at least one selected from the group consisting of benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydronaphthalene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethylcyclohexane, methylcyclohexane, cyclohexane, cyclohexene, p-menthane, dipropyl ether, dibutyl ether, anisole, butyl acetate, amyl acetate, methyl isobutyl ketone, and a combination thereof, and
when adding 70 g of the composition to a 100 ml container, sealing the container, leaving the sealed container at 40° C. for 28 days, and then taking a 1 ml sample of gas from the sealed container, the 1 ml sample of the gas comprises hydrogen gas (H2), silane gas (SiH4), and ammonia gas (NH3), and the hydrogen gas, the silane gas, and the ammonia gas satisfy Equation 1:
(hydrogen gas amount (ppm))/(silane gas amount (ppm)+ammonia gas amount (ppm))≥1.5   [Equation 1].