US 12,263,513 B2
Coated die for use in hot stamping
Tatsuya Shouji, Tokyo (JP)
Assigned to Proterial, Ltd., Tokyo (JP)
Appl. No. 17/298,955
Filed by Proterial, Ltd., Tokyo (JP)
PCT Filed Nov. 27, 2019, PCT No. PCT/JP2019/046461
§ 371(c)(1), (2) Date Jun. 2, 2021,
PCT Pub. No. WO2020/116291, PCT Pub. Date Jun. 11, 2020.
Claims priority of application No. 2018-226540 (JP), filed on Dec. 3, 2018.
Prior Publication US 2022/0032357 A1, Feb. 3, 2022
Int. Cl. B21D 37/01 (2006.01); B21D 22/02 (2006.01); C23C 28/00 (2006.01)
CPC B21D 22/02 (2013.01) [B21D 22/022 (2013.01); B21D 37/01 (2013.01); C23C 28/34 (2013.01); C23C 28/42 (2013.01); C23C 28/44 (2013.01)] 2 Claims
OG exemplary drawing
 
1. A coated die for use in hot stamping, which has a hard film on a work surface, wherein
the hard film has an alternating lamination section formed by alternating lamination of a1 layers consisting of nitride in which a metal part including semimetals has 30% or more of chromium in atomic ratio, and a2 layers consisting of nitride in which a metal part including semimetals has 50% or more of vanadium in atomic ratio, and
when ta1 and ta2 are defined as thicknesses of the a1 layer and the a2 layer respectively,
a film thickness ratio Xb is defined as a film thickness ratio ta2/ta1 of a1 layers and a2 layers adjacent to each other in a substrate-side region of the alternating lamination section and a film thickness ratio Xt is defined as a film thickness ratio ta2/ta1 of a1 layers and a2 layers adjacent to each other in an outermost surface side region of the alternating lamination section,
it holds that Xt>Xb,
the Xt is 1.2 or more, and the Xb is 1.0 or less.