US 11,943,540 B2
Method and apparatus for automatic exposure
Gunawath Dilshan Godaliyadda, Allen, TX (US); Mayank Mangla, Allen, TX (US); and Gang Hua, Katy, TX (US)
Assigned to Texas Instruments Incorporated, Dallas, TX (US)
Filed by Texas Instruments Incorporated, Dallas, TX (US)
Filed on Sep. 30, 2021, as Appl. No. 17/491,382.
Prior Publication US 2023/0100077 A1, Mar. 30, 2023
Int. Cl. H04N 23/71 (2023.01); H04N 23/73 (2023.01)
CPC H04N 23/71 (2023.01) [H04N 23/73 (2023.01)] 26 Claims
OG exemplary drawing
 
1. A method for automatic exposure (AE) control, the method comprising:
receiving statistics for AE control of an imaging sensor system;
obtaining values of one or more weights of a cost function, wherein the values of the one or more weights are predetermined using a learning process based on a plurality of images corresponding to different exposure values;
determining an exposure value EV for the imaging sensor system using the cost function based on the received statistics, wherein the cost function includes the one or more predetermined weights; and
determining AE settings for the imaging sensor system based on the determined exposure value EV.