US 11,942,340 B2
Particle beam inspection apparatus
Jeroen Gerard Gosen, Westport, CT (US); Te-Yu Chen, San Jose, CA (US); Dennis Herman Caspar Van Banning, Best (NL); Edwin Cornelis Kadijk, Eindhoven (NL); Martijn Petrus Christianus Van Heumen, Santa Clara, CA (US); Erheng Wang, San Jose, CA (US); and Johannes Andreas Henricus Maria Jacobs, Veldhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jul. 6, 2022, as Appl. No. 17/811,047.
Application 17/811,047 is a continuation of application No. 16/514,843, filed on Jul. 17, 2019, granted, now 11,430,678.
Claims priority of provisional application 62/869,986, filed on Jul. 2, 2019.
Claims priority of provisional application 62/699,643, filed on Jul. 17, 2018.
Prior Publication US 2022/0415678 A1, Dec. 29, 2022
Int. Cl. H01L 21/67 (2006.01); G03F 7/00 (2006.01)
CPC H01L 21/67201 (2013.01) [G03F 7/70841 (2013.01); G03F 7/70858 (2013.01); H01L 21/67098 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A load lock system, comprising:
a supporting structure configured to support a wafer;
a first gas vent configured to provide a gas having a conditioned temperature to adjust a temperature of the wafer; and
a controller including a processor and a memory, the controller configured to assist with control of the gas to condition the wafer before the wafer is transferred from the load lock system to a main chamber for inspection,
wherein the controller is further configured to assist with the control of the gas based on a temperature of a wafer stage in the main chamber.