US 11,940,731 B2
Photoresist topcoat compositions and methods of processing photoresist compositions
Irvinder Kaur, Northborough, MA (US); Cong Liu, Shrewsbury, MA (US); Doris Kang, Shrewsbury, MA (US); and Chunyi Wu, Shrewsbury, MA (US)
Assigned to Rohm and Haas Electronic Materials LLC, Marlborough, MA (US)
Filed by Rohm and Haas Electronic Materials LLC, Marlborough, MA (US)
Filed on Jun. 24, 2019, as Appl. No. 16/449,955.
Claims priority of provisional application 62/692,746, filed on Jun. 30, 2018.
Prior Publication US 2020/0004152 A1, Jan. 2, 2020
Int. Cl. G03F 7/11 (2006.01); C09D 133/14 (2006.01); C09D 133/16 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01)
CPC G03F 7/11 (2013.01) [C09D 133/14 (2013.01); C09D 133/16 (2013.01); C08F 220/281 (2020.02); C08F 220/283 (2020.02); C08F 220/382 (2020.02); C08F 220/387 (2020.02); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01)] 16 Claims
 
1. A photoresist topcoat composition, comprising:
a matrix polymer;
a surface active polymer, wherein the surface active polymer comprises polymerized units of the following general formula (I):

OG Complex Work Unit Chemistry
wherein: R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 haloalkyl group; R2 independently represents a hydrogen atom or an optionally substituted alkyl group, wherein at least one R2 is not a hydrogen atom, wherein the R2 groups taken together optionally form a cyclic structure, and wherein the total number of carbon atoms for the R2 groups taken together is from 2 to 20; R3 represents an optionally substituted C1-C4 alkylene group, and an R2 group optionally forms a cyclic structure with R3; and R4 independently represents C1-C4 fluoroalkyl groups;
wherein the total polymerized units of general formula (I) are present in the surface active polymer in an amount of 95 wt % or more based on total polymerized units of the surface active polymer; and wherein the surface active polymer is present in the composition in an amount of from 0.1 to 30 wt % based on total solids of the composition;
an acid generator compound; and
an organic-based solvent system comprising a plurality of organic solvents.