US 11,939,648 B1
Selective oxide-forming alloy, coating formed from and machine component including same
Collin Scott Holgate, Santa Barbara, CA (US); Tresa Marie Pollock, Santa Barbara, CA (US); Carlos Gerardo Levi, Santa Barbara, CA (US); and Akane Suzuki, Ballston Spa, NY (US)
Assigned to General Electric Company, Schenectady, NY (US); and The Regents of the University of California, Oakland, CA (US)
Filed by General Electric Company, Schenectady, NY (US); and The Regents of the University of California, Oakland, CA (US)
Filed on Mar. 15, 2023, as Appl. No. 18/121,940.
Int. Cl. C22C 30/00 (2006.01)
CPC C22C 30/00 (2013.01) 20 Claims
OG exemplary drawing
 
1. An alloy comprising:
between 20 atomic percent and 26 atomic percent silicon (Si);
between 21 atomic percent and 27 atomic percent titanium (Ti);
between 32 atomic percent and 39 atomic percent aluminum (Al);
between 5 atomic percent and 10 atomic percent hafnium (Hf); and
a balance of niobium (Nb).