US 12,261,586 B2
Surface acoustic wave resonator device and method for manufacturing the same and filter
Chencheng Zhou, Shenzhen (CN); Jie Zou, Guangdong (CN); and Gongbin Tang, Shenzhen (CN)
Assigned to Shenzhen Newsonic Technologies Co., Ltd., Shenzhen (CN)
Filed by Shenzhen Newsonic Technologies Co., Ltd., Guangdong (CN)
Filed on Jan. 22, 2024, as Appl. No. 18/418,709.
Claims priority of application No. 202311345403.5 (CN), filed on Oct. 18, 2023.
Prior Publication US 2024/0204749 A1, Jun. 20, 2024
Int. Cl. H03H 9/25 (2006.01); H03H 3/08 (2006.01); H03H 9/64 (2006.01)
CPC H03H 9/25 (2013.01) [H03H 3/08 (2013.01); H03H 9/64 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A method for manufacturing a surface acoustic wave resonator device, comprising:
providing a piezoelectric substrate; and
forming an interdigital transducer on the piezoelectric substrate, wherein the interdigital transducer comprises a plurality of interdigital electrodes, and the plurality of interdigital electrodes extend along a first direction and are arranged at intervals along a second direction, wherein forming the interdigital transducer on the piezoelectric substrate comprises:
forming a plurality of initial interdigital electrodes on the piezoelectric substrate, wherein in the second direction, each initial interdigital electrode has a first width, and every two adjacent initial interdigital electrodes have an initial interdigital gap with a first spacing therebetween; and
forming a plurality of additional interdigital electrodes on the piezoelectric substrate, wherein the plurality of additional interdigital electrodes are respectively connected to the plurality of initial interdigital electrodes, and each initial interdigital gap has a portion filled by one of the plurality of additional interdigital electrodes; each interdigital electrode comprises an initial interdigital electrode and an additional interdigital electrode that are connected to each other;
wherein in the second direction, the each interdigital electrode has a second width, and every two adjacent interdigital electrodes have a second spacing therebetween; the second width of the each interdigital electrode is greater than the first width of a corresponding initial interdigital electrode, and the second spacing between two adjacent interdigital electrodes is smaller than the first spacing between corresponding two adjacent initial interdigital electrodes,
wherein
forming the plurality of initial interdigital electrodes comprises performing a first patterning process using a photomask, and the photomask is placed at a first position during the first patterning process;
forming the plurality of additional interdigital electrodes comprises performing a second patterning process using the photomask, wherein the photomask is placed at a second position during the second patterning process; and
the second position is offset relative to the first position in the second direction.