| CPC H01M 4/1395 (2013.01) [H01M 4/134 (2013.01); H01M 2004/027 (2013.01)] | 24 Claims | 

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               1. A method for electrode processing, the method comprising: 
            controlling furnace atmosphere during processing of a silicon-dominated electrode in a furnace, wherein: 
              the furnace comprises a plurality of chambers; 
                  the processing comprises a plurality of steps comprising at least a pyrolysis step comprising pyrolysis of the silicon-dominated electrode, and one or more pre-pyrolysis steps comprising applying one or more pyrolysis related pre-pyrolysis functions; 
                  at least some of the plurality of steps are applied in sequence, at different points in different ones of the plurality of chambers, with each of the pyrolysis step and the one or more pre-pyrolysis steps performed in different ones of the plurality of chambers; and 
                  the controlling comprises: 
                creating in at least one of the plurality of chambers a vacuum environment in the furnace; 
                    subsequently creating a non-vacuum environment in the at least one of the plurality of chambers, wherein creating the non-vacuum environment comprises setting or adjusting one or both of: pressure of the furnace atmosphere, and composition of the furnace atmosphere; and 
                    applying one or more measures in a chamber where the pyrolysis step is applied, wherein the one or more measures are set or configured to maintain at least one environment condition created in the furnace prior to initiating of the pyrolysis. 
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