US 12,261,191 B2
Display device having a pad part disposed on a barrier layer, method of manufacturing the same and tiled display device including the same
Jung Yun Jo, Namyangju-si (KR); and Kwang Hyun Kim, Hwaseong-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-Si (KR)
Filed on Nov. 15, 2021, as Appl. No. 17/526,009.
Claims priority of application No. 10-2021-0027203 (KR), filed on Mar. 2, 2021.
Prior Publication US 2022/0285428 A1, Sep. 8, 2022
Int. Cl. H01L 27/15 (2006.01); H01L 33/00 (2010.01); H01L 33/50 (2010.01)
CPC H01L 27/156 (2013.01) [H01L 33/005 (2013.01); H01L 33/50 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A display device comprising:
a first substrate;
a barrier layer disposed on the first substrate and having amorphous carbon;
a first pad part disposed on the barrier layer;
a second substrate disposed on the first pad part;
a display layer disposed on the second substrate;
a second pad part disposed on a bottom surface of the first substrate and inserted into a first contact hole penetrating the first substrate and the barrier layer;
a first connection line disposed on a first surface of the second substrate, and connected to the second pad part through a second contact hole penetrating the second substrate;
a light blocking layer disposed on the first surface of the second substrate and spaced apart from the first connection line; and
a buffer layer disposed on the first connection line, the light blocking layer, and the first surface of the second substrate,
wherein the first connection line and the light blocking layer have a same material.
 
13. A tiled display device comprising:
a plurality of display devices, each including a display area including a plurality of pixels and a non-display area surrounding the display area; and
a bonding member configured to bond the plurality of display devices,
wherein each of the plurality of display devices includes:
a first substrate;
a barrier layer disposed on the first substrate and having amorphous carbon;
a first pad part disposed on the barrier layer;
a second substrate disposed on the first pad part;
a display layer disposed on the second substrate;
a second pad part disposed on a bottom surface of the first substrate and inserted into a first contact hole penetrating the first substrate and the barrier layer;
a first connection line disposed on a first surface of the second substrate, and connected to the second pad part through a second contact hole penetrating the second substrate;
a buffer layer disposed on the first connection line and the first surface of the second substrate;
a transistor comprising a source electrode and a drain electrode disposed on the buffer layer;
an insulating layer disposed on the source electrode and the drain electrode;
a second connection line disposed on the insulating layer and connected to the first connection line through a third contact hole penetrating the buffer layer and the insulating layer; and
a connection electrode disposed on the insulating layer and connected to the source electrode or the drain electrode through a fourth contact hole penetrating the insulating layer,
wherein the second connection line and the connection electrode have a same material.