US 12,261,064 B2
Tank, substrate processing apparatus, and method of using the tank
Tomohiko Muta, Koshi (JP); Daiki Shibata, Koshi (JP); Akiko Kai, Koshi (JP); and Makoto Ogata, Koshi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on May 8, 2020, as Appl. No. 16/870,085.
Claims priority of application No. 2019-089850 (JP), filed on May 10, 2019.
Prior Publication US 2020/0357662 A1, Nov. 12, 2020
Int. Cl. H01L 21/67 (2006.01); B05C 11/10 (2006.01)
CPC H01L 21/6715 (2013.01) [B05C 11/10 (2013.01); H01L 21/67178 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A tank, comprising:
a container part having an upper wall extending in a horizontal direction, a sidewall extending along a vertical direction and a bottom wall, and configured to store a processing liquid therein;
a liquid discharge passage having a liquid discharge port installed at a position higher than a liquid surface of the processing liquid stored in the container part, and configured to discharge the processing liquid into the container part; and
a gas discharge passage having a gas discharge port installed at a position higher than the liquid surface, and configured to discharge a gas into the container part,
wherein the liquid discharge passage is configured to discharge the processing liquid from the liquid discharge port so that the processing liquid is brought into contact with a portion above the liquid surface of an inner surface of the sidewall,
wherein the gas discharge passage is configured to discharge the gas from the gas discharge port so that the gas is brought into contact with a portion above the liquid surface of an inner surface of the container part,
wherein a cross section of the inner surface of the sidewall is circular in a plane intersecting the vertical direction, and
wherein both a virtual line extending in an extension direction of an end of the liquid discharge passage including the liquid discharge port, and a virtual line extending in an extension direction of an end of the gas discharge passage including the gas discharge port are not orthogonal to the inner surface of the sidewall, as viewed in a plan view.