US 12,261,062 B2
Spot heating by moving a beam with horizontal rotary motion
Shu-Kwan Danny Lau, Sunnyvale, CA (US); Toshiyuki Nakagawa, Narita (JP); and Zhiyuan Ye, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 19, 2023, as Appl. No. 18/223,923.
Application 18/223,923 is a continuation of application No. 16/923,949, filed on Jul. 8, 2020, granted, now 11,842,907.
Prior Publication US 2023/0369077 A1, Nov. 16, 2023
Int. Cl. H01L 21/67 (2006.01); B23K 26/00 (2014.01); B23K 26/06 (2014.01); B23K 26/08 (2014.01); B23K 103/00 (2006.01); F27B 17/00 (2006.01); F27D 5/00 (2006.01); F27D 9/00 (2006.01); H01L 21/268 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/67115 (2013.01) [B23K 26/0006 (2013.01); B23K 26/0648 (2013.01); B23K 26/0869 (2013.01); F27B 17/0025 (2013.01); F27D 5/0037 (2013.01); H01L 21/268 (2013.01); H01L 21/68764 (2013.01); B23K 2103/56 (2018.08); F27D 2009/007 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A process chamber, comprising:
a first window;
a second window;
a substrate support disposed between the first window and the second window,
the substrate support configured to support a substrate;
a rotary stage disposed in a first plane above the first window; and
a rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window, such that the rotatable radiant spot heating source is mounted to the rotary stage and positioned at an acute angle with respect to the first plane, wherein the rotary stage is rotatable to rotate the rotatable radiant spot heating source about a rotational axis orthogonal to the first plane, the rotatable radiant spot heating source configured to direct the radiant energy toward the substrate supported on the substrate support in a sweeping motion at least partially along an arcuate path, the arcuate path extending from a center of the substrate to a circumference of the substrate.