| CPC H01J 37/3244 (2013.01) [H01J 37/32201 (2013.01); H01J 37/32495 (2013.01); H01J 2237/0268 (2013.01)] | 14 Claims |

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1. A microwave plasma apparatus for processing a material, comprising:
a quartz tube in communication with at least one microwave radiation source, a reaction chamber, and a material feeding system; and
a liner disposed within the quartz tube, the liner comprising a material resistant to H2, CO2, or CH4 gasses;
wherein the liner is disposed between the quartz tube and a plasma generation zone of the microwave plasma apparatus;
wherein the liner comprises a coating of the material resistant to H2, CO2, or CH4 gasses applied to the quartz tube.
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12. An interior liner disposed in a microwave plasma apparatus, the liner comprising a material resistant to H2, CO2, or CH4 gasses and positioned between a quartz tube and a plasma generation zone of the microwave plasma apparatus, wherein the interior liner is a continuous coating of the material applied to the quartz tube.
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