US 12,261,019 B2
Voltage pulse time-domain multiplexing
Kartik Ramaswamy, San Jose, CA (US); Yang Yang, San Diego, CA (US); and Yue Guo, Redwood City, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 17, 2022, as Appl. No. 18/047,006.
Application 18/047,006 is a continuation of application No. 17/410,803, filed on Aug. 24, 2021, granted, now 11,476,090.
Prior Publication US 2023/0067046 A1, Mar. 2, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); H03K 3/57 (2006.01)
CPC H01J 37/32128 (2013.01) [H03K 3/57 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A plasma processing system comprising:
a voltage waveform generator configured to deliver a voltage waveform to an electrode disposed within a chamber of the plasma processing system, the voltage waveform generator comprising:
voltage source circuitry;
a first switch coupled between the voltage source circuitry and a first output node of the waveform generator, the first output node being configured to be coupled to the electrode;
a second switch coupled between the first output node and electrical ground node;
a third switch coupled between the voltage source circuitry and a second output node of the waveform generator, the second output node being configured to be coupled to the electrode; and
a fourth switch coupled between the second output node and the electrical ground node.