US 12,261,015 B2
Electron beam inspection apparatus
Atsushi Ando, Edogawa-ku (JP); and Takahiro Murata, Zushi (JP)
Assigned to NuFlare Technology, Inc., Yokohama (JP)
Filed by NuFlare Technology, Inc., Yokohama (JP)
Filed on Aug. 31, 2022, as Appl. No. 17/823,604.
Claims priority of application No. 2021-168233 (JP), filed on Oct. 13, 2021.
Prior Publication US 2023/0113062 A1, Apr. 13, 2023
Int. Cl. H01J 37/20 (2006.01); H01J 37/244 (2006.01)
CPC H01J 37/20 (2013.01) [H01J 37/244 (2013.01); H01J 2237/0475 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/2448 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An electron beam inspection apparatus comprising:
an optical system irradiating a substrate with primary electron beams;
a beam separator separating, from the primary electron beams, secondary electron beams emitted as a result of irradiating the substrate with the primary electron beams;
a detector detecting the secondary electron beams separated;
a movable stage on which the substrate is placed;
a support base supporting the substrate on the stage; and
an applying unit applying a first voltage to the substrate,
wherein the support base includes a plurality of support pins that support the substrate from below,
the support pins each include a columnar insulator and a metal film disposed in the insulator, and
a second voltage is applied to the metal film.