US 12,260,539 B2
Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method
Minho Kim, Yongin-si (KR); Hakseung Han, Hwaseong-si (KR); Jiyoung Kim, Hwaseong-si (KR); and Jinback Park, Hwaseong-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jan. 4, 2023, as Appl. No. 18/093,030.
Application 18/093,030 is a division of application No. 17/189,893, filed on Mar. 2, 2021, granted, now 11,562,477.
Claims priority of application No. 10-2020-0083673 (KR), filed on Jul. 7, 2020.
Prior Publication US 2023/0142328 A1, May 11, 2023
Int. Cl. G06K 9/00 (2022.01); G01N 21/95 (2006.01); G02B 27/14 (2006.01); G06T 7/00 (2017.01)
CPC G06T 7/0006 (2013.01) [G01N 21/9501 (2013.01); G02B 27/14 (2013.01); G06T 2207/30148 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A method of measuring pattern uniformity on the basis of a pupil image, the method comprising:
generating and outputting light by using a light source;
transferring, by using an optical system, the light from the light source to a measurement target disposed on a stage, wherein the measurement target comprises an array area of repeating patterns;
detecting, by using a first detector, light reflected and diffracted by the measurement target or light diffracted by passing through the measurement target; and
measuring pattern uniformity of the repeating patterns of the array area of the measurement target on the basis of the light detected by the first detector, wherein
the detecting of the light comprises detecting a pupil image of a pupil plane by using the first detector, and
the measuring of the pattern uniformity of the repeating patterns comprises measuring the pattern uniformity of the repeating patterns on the basis of detecting the intensity of at least one of zero-order light and 1st-order light of the pupil image.