| CPC G02B 3/0081 (2013.01) [A61F 2/16 (2013.01); A61F 2/1648 (2013.01); B82Y 20/00 (2013.01); G02B 5/18 (2013.01); G02B 5/1828 (2013.01); G02B 5/1895 (2013.01); G02B 27/0025 (2013.01); G02B 27/0037 (2013.01); G02B 27/0075 (2013.01); G02B 27/4205 (2013.01); G02B 27/4211 (2013.01); G02C 7/022 (2013.01); G02C 7/04 (2013.01); G02C 7/049 (2013.01); G02C 7/06 (2013.01); A61F 2/1613 (2013.01); G02B 3/00 (2013.01); G02C 2202/22 (2013.01); Y10S 977/902 (2013.01); Y10S 977/932 (2013.01)] | 12 Claims |

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1. An optical processor for applying to a light field passing through a predetermined imaging lens unit, said optical processor comprising a pattern in the form of spaced apart regions of different optical properties, said pattern being configured to define a phase coder affecting profiles of Through Focus Modulation Transfer Function (TFMTF) for different wavelength components of said light field in accordance with a predetermined profile of an extended depth of focusing to be obtained by said imaging lens unit; and a dispersion profile coder configured in accordance with the said imaging lens unit and said predetermined profile of the extended depth of focusing to provide a predetermined overlapping between said TFMTF profiles within said predetermined profile of the extended depth of focusing, wherein the phase coder comprises a first pattern formed by a predetermined number of phase transitions being of substantially the same transparency and arranged with a low spatial frequency, so as to induce substantially non-diffractive phase effect onto the light field and the dispersion profile coder comprises a second pattern, which is substantially diffractive and which is configured to provide a predetermined optical power addition to the imaging lens unit, such that total optical power of an imaging lens arrangement formed by said predetermined imaging lens unit and said dispersion profile coder corresponds to a desired optical power and dispersion induced by said dispersion profile coder and the imaging lens unit effects shifting of the TFMTF profiles within said predetermined profile of the extended depth of focusing, wherein one of the first and second patterns is incorporated in the lens unit, and other of said first and second patterns is a mask located at either side of the lens unit.
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