US 12,258,676 B2
Pre-heat ring and substrate processing device
Liu Ziqiang, Wuxi (CN)
Assigned to Jiangsu Alpha-Semiconductor Equipment Co., Ltd., Wuxi (CN)
Appl. No. 18/012,639
Filed by JIANGSU ALPHA-SEMICONDUCTOR EQUIPMENT CO., LTD., Wuxi (CN)
PCT Filed Oct. 19, 2022, PCT No. PCT/CN2022/126189
§ 371(c)(1), (2) Date Dec. 22, 2022,
PCT Pub. No. WO2023/071886, PCT Pub. Date May 4, 2023.
Claims priority of application No. 202111249083.4 (CN), filed on Oct. 26, 2021.
Prior Publication US 2024/0102199 A1, Mar. 28, 2024
Int. Cl. C30B 25/12 (2006.01); C30B 25/10 (2006.01); C30B 25/18 (2006.01)
CPC C30B 25/10 (2013.01) [C30B 25/12 (2013.01); C30B 25/186 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A pre-heat ring for a substrate processing device, wherein the substrate processing device comprises: a reaction chamber, a bearing disk, the pre-heat ring and a gas injection port; the bearing disk is arranged in the reaction chamber and used to supporting a substrate; the pre-heat ring is arranged around the bearing disk; a supporting piece is arranged in the reaction chamber and used to support the pre-heat ring; the gas injection port is formed in one side of the reaction chamber and used to introduce a process gas;
the pre-heat ring comprises a ring body;
the ring body comprises an inner periphery and an outer periphery;
the inner periphery and the outer periphery each comprise a first section and a second section, the first section is a section corresponding to the gas injection port, and the second section is the other section that does not correspond to the gas injection port; and the first section of the outer periphery comprises an extending part formed by extending towards a gas injection port side in at least part of areas of the first section along a radial direction of the pre-heat ring;
wherein a first width is present between the outer periphery and the inner periphery of the second section of the ring body, and the first width is constant;
the inner periphery is circular, and the center of the inner periphery coincides with the center of the bearing disk;
a second width is present between the outer periphery and the inner periphery of the first section of the ring body, and the second width is greater than the first width.