US 12,258,663 B2
Apparatus and method of manufacturing oxide film and display apparatus including the oxide film
Jaeyoon Park, Paju-si (KR); JaeHyeon Park, Paju-si (KR); KiHoon Park, Paju-si (KR); and PilSang Yun, Paju-si (KR)
Assigned to LG Display Co., Ltd., Seoul (KR)
Filed by LG Display Co., Ltd., Seoul (KR)
Filed on Mar. 8, 2023, as Appl. No. 18/180,585.
Application 18/180,585 is a division of application No. 16/254,264, filed on Jan. 22, 2019, abandoned.
Claims priority of application No. 10-2018-0018599 (KR), filed on Feb. 14, 2018.
Prior Publication US 2023/0220547 A1, Jul. 13, 2023
Int. Cl. C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); H01L 27/12 (2006.01)
CPC C23C 16/45523 (2013.01) [C23C 16/40 (2013.01); C23C 16/407 (2013.01); C23C 16/4412 (2013.01); C23C 16/4481 (2013.01); C23C 16/4485 (2013.01); C23C 16/45561 (2013.01); H01L 27/1262 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method of manufacturing an oxide film, the method comprising:
loading a substrate into a process chamber;
generating a first source gas having a first vapor pressure using a first source container module that is connected to an intermediate connection point that is external to the process chamber, the intermediate connection point connected to a first gas injection port of the process chamber;
generating a second source gas having a second vapor pressure that is different from the first vapor pressure using a second source container module that is connected to the intermediate connection point, the second source gas supplied to the intermediate connection point based on the second vapor pressure of the second source gas;
supplying a first carrier gas to the first source container module such that the first source gas and the first carrier gas are supplied to the intermediate connection point responsive to the first carrier gas being supplied to the first source container module;
supplying a force gas to the intermediate connection point via a gas path that is between the second source container module and the intermediate connection point, the force gas not supplied to the second source container module;
generating a mixed gas at the intermediate connection point that includes the first source gas, the second source gas, the first carrier gas, and the force gas;
supplying the mixed gas to the process chamber via the first gas injection port, wherein an organic material precursor from the mixed gas is absorbed by the substrate;
supplying a reactant gas to the process chamber via one or more second gas injection ports of the process chamber after the organic material precursor is absorbed by the substrate;
generating plasma within the process chamber while the reactant gas is supplied to the process chamber, the plasma activating the reactant gas that is in the process chamber;
forming the oxide film on the substrate responsive to the activated reactant gas reacting with the organic material precursor that is absorbed by the substrate; and
supplying a purge gas to the first gas injection port.