US 12,258,660 B2
Vapor deposition apparatus and method
Erik M. Nielsen, Middletown, NY (US); and Peter F. Gero, Portland, CT (US)
Assigned to RTX Corporation, Farmington, CT (US)
Filed by Raytheon Technologies Corporation, Farmington, CT (US)
Filed on Feb. 16, 2021, as Appl. No. 17/176,436.
Application 17/176,436 is a continuation of application No. 15/202,984, filed on Jul. 6, 2016, abandoned.
Prior Publication US 2021/0172052 A1, Jun. 10, 2021
Int. Cl. C23C 14/26 (2006.01); C23C 14/24 (2006.01)
CPC C23C 14/26 (2013.01) [C23C 14/24 (2013.01); C23C 14/243 (2013.01); C23C 14/246 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A vapor deposition apparatus, comprising:
a chamber configured to operate at vacuum;
a crucible in the chamber, the crucible configured to receive an ingot;
a feeder operable to move the ingot with respect to the crucible; and
a heater in the chamber, the heater contained between the crucible and the feeder, and configured to heat a hot zone between the crucible and the feeder.