US 12,257,857 B2
Optical anti-counterfeiting element and manufacturing method thereof
Weiwei Zhang, Beijing (CN); Kai Sun, Beijing (CN); and Jun Zhu, Beijing (CN)
Assigned to ZHONGCHAO SPECIAL SECURITY TECHNOLOGY CO., LTD, Beijing (CN); and CHINA BANKNOTE PRINTING AND MINTING CORP., Beijing (CN)
Appl. No. 17/594,579
Filed by ZHONGCHAO SPECIAL SECURITY TECHNOLOGY CO., LTD, Beijing (CN); and CHINA BANKNOTE PRINTING AND MINTING CORP., Beijing (CN)
PCT Filed Apr. 3, 2020, PCT No. PCT/CN2020/083197
§ 371(c)(1), (2) Date Oct. 22, 2021,
PCT Pub. No. WO2020/216043, PCT Pub. Date Oct. 29, 2020.
Claims priority of application No. 201910336073.0 (CN), filed on Apr. 24, 2019.
Prior Publication US 2022/0184992 A1, Jun. 16, 2022
Int. Cl. B42D 25/373 (2014.01); B42D 25/324 (2014.01); B42D 25/328 (2014.01); B42D 25/351 (2014.01); B42D 25/36 (2014.01); B42D 25/415 (2014.01); B42D 25/425 (2014.01); B42D 25/445 (2014.01); B42D 25/45 (2014.01); G02B 5/28 (2006.01)
CPC B42D 25/373 (2014.10) [B42D 25/324 (2014.10); B42D 25/328 (2014.10); B42D 25/351 (2014.10); B42D 25/445 (2014.10); B42D 25/45 (2014.10); G02B 5/286 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An optical anti-counterfeiting element, comprising:
a substrate, wherein the substrate has a first surface and a second surface opposite to each other;
a surface relief structure layer, wherein the surface relief structure layer is located on the first surface of the substrate, and the surface relief structure layer comprises a first area and a second area, the first area is aligned with a hollow area of the optical anti-counterfeiting element and the second area is aligned with a non-hollow area of the optical anti-counterfeiting element, the first area comprises a first grating microstructure, the second area comprises a second grating microstructure and/or a flat structure, wherein a depth-to-width ratio of the first grating microstructure is greater than a depth-to-width ratio of the second grating microstructure, and/or a specific volume of the first grating microstructure is greater than a specific volume of the second grating microstructure; and
an interference color layer, wherein the interference color layer covers the second area homomorphically, the interference color layer is located in the non-hollow area of the optical anti-counterfeiting element, the interference color layers is a Fabry-Perot filter structure, an absorbing layer of the Fabry-Perot filter structure is in contact with the second area, and a material of the absorbing layer is an alloy.