US 12,257,784 B2
Systems for updating target maps including considerations of rotational position in electrochemical-additive manufacturing systems
David Pain, San Diego, CA (US); Kareemullah Shaik, San Diego, CA (US); Joshua Gillespie, Poway, CA (US); and Jeffrey Herman, San Diego, CA (US)
Assigned to Fabric8Labs, Inc., San Diego, CA (US)
Filed by Fabric8Labs, Inc., San Diego, CA (US)
Filed on Feb. 29, 2024, as Appl. No. 18/592,327.
Application 18/592,327 is a continuation of application No. 18/338,113, filed on Jun. 20, 2023, granted, now 11,945,170.
Application 18/338,113 is a continuation of application No. 18/064,686, filed on Dec. 12, 2022, granted, now 11,745,432, issued on Sep. 5, 2023.
Claims priority of provisional application 63/288,943, filed on Dec. 13, 2021.
Prior Publication US 2024/0246299 A1, Jul. 25, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. B29C 64/393 (2017.01); B29C 64/264 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); C25D 1/00 (2006.01); C25D 17/10 (2006.01); C25D 21/12 (2006.01)
CPC B29C 64/393 (2017.08) [B29C 64/264 (2017.08); C25D 1/003 (2013.01); C25D 17/10 (2013.01); C25D 21/12 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12)] 20 Claims
OG exemplary drawing
 
1. An electrochemical additive manufacturing system comprising:
a deposition power supply;
deposition control circuits, coupled to the deposition power supply;
an electrode array, comprising individually-addressable electrodes such that each of the individually-addressable electrodes is electrically coupled to one of the deposition control circuits;
a deposition electrode;
an electrode-position actuator configured to
(a) position the electrode array and the deposition electrode substantially parallel relative to each other in an initial relative position between the electrode array and the deposition electrode,
(b) using at least a rotational translation, spatially translate the electrode array and the deposition electrode from the initial relative position between the electrode array and the deposition electrode to a shifted relative position between the electrode array and the deposition electrode; and
a system controller configured to (a) create an initial target map, comprising individual target currents, based on the initial relative position between the electrode array and the deposition electrode, and (b) create an updated target map by shifting the individual target currents of the initial target map using a spatial reference between the initial relative position and the shifted relative position.