US 11,932,939 B2
Lids and lid assembly kits for atomic layer deposition chambers
Muhammad M. Rasheed, San Jose, CA (US); Srinivas Gandikota, Santa Clara, CA (US); Mario Dan Sanchez, San Jose, CA (US); Guoqiang Jian, San Jose, CA (US); Yixiong Yang, Santa Clara, CA (US); Deepak Jadhav, Hubli (IN); and Ashutosh Agarwal, Rajasthan (IN)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Apr. 28, 2021, as Appl. No. 17/242,898.
Application 17/242,898 is a continuation of application No. 14/734,838, filed on Jun. 9, 2015, granted, now 11,384,432.
Claims priority of provisional application 62/151,180, filed on Apr. 22, 2015.
Prior Publication US 2021/0246552 A1, Aug. 12, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/452 (2006.01); H01J 37/32 (2006.01)
CPC C23C 16/45544 (2013.01) [C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23C 16/4412 (2013.01); C23C 16/452 (2013.01); C23C 16/45502 (2013.01); C23C 16/45536 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); H01J 37/32357 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A lid for a substrate processing chamber, comprising:
a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate;
an upper flange extending radially outward from the lid plate; and
one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.