	US 11,932,906 B2
	System and methods for electrokinetic loading of sub-micron-scale reaction chambers
Guojun Chen, Sherborn, MA (US); Jeremy Lackey, Foster City, CA (US); Alexander Goryaynov, New Haven, CT (US); Gerard Schmid, Guilford, CT (US); Ali Kabiri, Guilford, CT (US); Jonathan M. Rothberg, Guilford, CT (US); Todd Rearick, Cheshire, CT (US); Jonathan C. Schultz, Guilford, CT (US); Farshid Ghasemi, Guilford, CT (US); and Keith G. Fife, Palo Alto, CA (US)
Assigned to Quantum-Si Incorporated, Branford, CT (US)
Filed by Quantum-Si Incorporated, Guilford, CT (US)
Filed on Jun. 17, 2021, as Appl. No. 17/350,509.
Application 17/350,509 is a division of application No. 16/239,789, filed on Jan. 4, 2019, granted, now 11,072,827.
Claims priority of provisional application 62/614,912, filed on Jan. 8, 2018.
Prior Publication US 2021/0310066 A1, Oct. 7, 2021
Int. Cl. C12Q 1/6869 (2018.01); B01L 3/00 (2006.01); C08L 1/02 (2006.01); C12Q 1/6806 (2018.01); G01N 21/64 (2006.01); G01N 27/447 (2006.01); G01N 30/86 (2006.01); G01N 30/88 (2006.01)

CPC C12Q 1/6869 (2013.01) [B01L 3/502761 (2013.01); B01L 3/50857 (2013.01); C08L 1/02 (2013.01); C12Q 1/6806 (2013.01); G01N 21/6428 (2013.01); G01N 21/6454 (2013.01); G01N 27/44743 (2013.01); G01N 27/44782 (2013.01); G01N 30/86 (2013.01); B01L 2200/0647 (2013.01); B01L 2300/0645 (2013.01); B01L 2300/0829 (2013.01); B01L 2300/0864 (2013.01); B01L 2400/0415 (2013.01); B01L 2400/0421 (2013.01); G01N 27/447 (2013.01); G01N 30/88 (2013.01)]

17 Claims

1. A method for loading a sample of interest in an integrated device, the method comprising:

receiving a suspension that includes the sample of interest onto a surface of the integrated device, wherein the suspension covers a reaction chamber formed into the surface;

applying an electrical signal between a first electrode and a second electrode; and

generating an electric field that operates to assist loading, into the reaction chamber, the sample of interest.