CPC B01D 53/90 (2013.01) [B01D 53/265 (2013.01); B01D 53/8631 (2013.01); B01D 53/8671 (2013.01); B01D 53/8696 (2013.01); B01D 53/96 (2013.01); B01D 2252/20447 (2013.01); B01D 2252/20484 (2013.01); B01D 2252/504 (2013.01); B01D 2257/404 (2013.01); B01D 2257/504 (2013.01); B01D 2258/0216 (2013.01)] | 20 Claims |
1. A system comprising:
an abatement apparatus configured to abate an emission stream from a semiconductor manufacturing process;
a condenser coupled to the abatement apparatus and configured to reduce water vapor of the emission stream and yield an effluent; and
a reduction tower coupled to the condenser, wherein the reduction tower comprises:
a reduction chamber having an inlet coupled to an outlet of the condenser, and
a nozzle disposed within the reduction chamber and configured to dispense a solution therein, which catalyzes a chemical reaction to absorb a pollutant from the effluent and yield an exhaust substantially free of the pollutant.
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