US 12,256,578 B2
Optical sensing apparatus
Yen-Cheng Lu, Hsinchu County (TW); Yu-Hsuan Liu, Hsinchu County (TW); Jung-Chin Chiang, Chiang (TW); Yun-Chung Na, San Jose, CA (US); Tsung-Ting Wu, Hsinchu County (TW); Zheng-Shun Liu, Hsinchu County (TW); and Chou-Yun Hsu, Hsinchu County (TW)
Assigned to Artilux, Inc., Menlo Park, CA (US)
Filed by ARTILUX, INC., Menlo Park, CA (US)
Filed on Oct. 2, 2024, as Appl. No. 18/905,089.
Application 18/905,089 is a continuation of application No. 18/222,261, filed on Jul. 14, 2023.
Application 18/222,261 is a continuation in part of application No. 17/729,393, filed on Apr. 26, 2022.
Claims priority of provisional application 63/385,212, filed on Nov. 29, 2022.
Claims priority of provisional application 63/403,795, filed on Sep. 5, 2022.
Claims priority of provisional application 63/183,664, filed on May 4, 2021.
Prior Publication US 2025/0031466 A1, Jan. 23, 2025
Int. Cl. H10F 30/225 (2025.01); H10F 39/00 (2025.01); H10F 77/14 (2025.01); H10F 77/30 (2025.01)
CPC H10F 77/334 (2025.01) [H10F 30/2255 (2025.01); H10F 39/8033 (2025.01); H10F 77/14 (2025.01)] 19 Claims
OG exemplary drawing
 
1. An optical sensing apparatus comprising:
a substrate comprising a first material;
an absorption region comprising a second material different from the first material, the absorption region configured to receive an optical signal and generate photo-carriers in response to receiving the optical signal;
an amplification region formed in the substrate configured to collect at least a portion of the photo-carriers from the absorption region and to amplify the portion of the photo-carriers;
a buried-dopant region formed in the substrate configured to collect at least a portion of the amplified portion of the photo-carriers from the amplification region, wherein the amplification region is between the absorption region and the buried-dopant region; and
an interface-dopant region formed between the absorption region and the buried-dopant region in the substrate,
wherein the buried-dopant region comprises one or more first buried-dopant regions and one or more second buried-dopant regions at least partially surrounding the one or more first buried-dopant regions,
wherein the one or more first buried-dopant regions and the one or more second buried-dopant regions are doped with a dopant having a first conductivity type,
wherein a property associated with the one or more first buried-dopant regions is different from the property associated with the second buried-dopant regions so as to form, under a reverse bias breakdown voltage, one or more punch-through regions and one or more blocking regions in the amplification region, wherein the one or more punch-through regions are adjacent to the one or more first buried-dopant regions and the one or more blocking regions are adjacent to the one or more second buried-dopant regions, and
wherein the property comprises a peak doping concentration or a depth.