| CPC H05B 1/0233 (2013.01) [C23C 16/46 (2013.01); C23C 16/52 (2013.01); G05D 23/1917 (2013.01); G05D 23/2401 (2013.01); H05B 3/22 (2013.01); H05B 2203/005 (2013.01)] | 12 Claims |

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1. An apparatus for heating a substrate, comprising:
a stage on which the substrate is placed and including at least one resistance heater configured to heat the substrate;
a temperature detector configured to detect a heating temperature of the substrate heated by the at least one resistance heater;
a temperature calculator configured to calculate the heating temperature based on a resistance value of the at least one resistance heater, which is obtained from a current value and a voltage value of a power supplied to the at least one resistance heater;
a power controller configured to perform a power control with respect to a first power to be supplied to the at least one resistance heater such that the heating temperature is adjusted towards a first preset temperature by applying a phase control and a zero-cross control in a switching manner with respect to a power output from an alternate current (AC) power supply; and
a controller,
wherein the controller is configured to:
switch the power control of the power controller such that, in a low temperature range in which the heating temperature is lower than a preset switching temperature, the power control is performed through the phase control based on a detection result of the heating temperature detected by the temperature detector and, in a high temperature range in which the heating temperature is higher than the preset switching temperature, the power control is performed through the zero-cross control based on a calculation result of the heating temperature calculated by the temperature calculator.
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