US 12,255,378 B2
Window system
Chunnan Feng, Beijing (CN); Yong Li, Beijing (CN); Yunnan Jin, Beijing (CN); Sihui Bao, Beijing (CN); Zhifeng Zhang, Beijing (CN); Yongsheng Ma, Beijing (CN); Zhi Hou, Beijing (CN); Chuncheng Che, Beijing (CN); Feng Qu, Beijing (CN); and Biqi Li, Beijing (CN)
Assigned to Beijing BOE Sensor Technology Co., Ltd., Beijing (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Appl. No. 18/018,978
Filed by Beijing BOE Sensor Technology Co., Ltd., Beijing (CN); and BOE Technology Group Co., Ltd., Beijing (CN)
PCT Filed Jan. 28, 2022, PCT No. PCT/CN2022/074519
§ 371(c)(1), (2) Date Jan. 31, 2023,
PCT Pub. No. WO2023/141919, PCT Pub. Date Aug. 3, 2023.
Prior Publication US 2024/0258680 A1, Aug. 1, 2024
Int. Cl. H01Q 1/12 (2006.01); G02F 1/1333 (2006.01); G02F 1/1343 (2006.01); G02F 1/137 (2006.01)
CPC H01Q 1/1271 (2013.01) [G02F 1/133302 (2021.01); G02F 1/134309 (2013.01); G02F 1/137 (2013.01); G02F 2202/04 (2013.01); G02F 2202/06 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A window system, comprising:
a first transparent substrate and a second transparent substrate opposite to each other, and
a radiation structure and a dimming structure sequentially arranged on a side of the first transparent substrate close to the second transparent substrate;
wherein an orthographic projection of the dimming structure on the first transparent substrate at least partially overlaps an orthographic projection of the radiation structure on the first transparent substrate;
wherein the radiation structure comprises:
a first substrate and a second substrate opposite to each other; wherein the first substrate is on a side of the first transparent substrate close to the dimming structure, and the second substrate is on a side of the dimming structure close to the first transparent substrate;
a feeding structure on a side of the first substrate close to the second substrate; and
a radiation coupling layer on a side of the second substrate close to the first substrate, wherein the feeding structure and the radiation coupling layer have a first spacing therebetween;
wherein the radiation coupling layer is provided with a slit; and an orthographic projection of the slit on the second substrate at least partially overlaps with an orthographic projection of the feeding structure on the second substrate;
wherein an arrangement direction of the feeding structure is at least partially different from that of the slit; and
wherein the slit comprises a first sub-slit extending along a first direction, and a second sub-slit and a third sub-slit respectively connected to both ends of the first sub-slit and each extending along a second direction, and the first direction intersects with the second direction;
an extending direction of the feeding structure is substantially the same as the first direction, and intersects with the second direction; and
the orthographic projection of the feeding structure on the second substrate does not overlap an orthographic projection of the first sub-slit on the second substrate.