| CPC H01L 33/10 (2013.01) [H01L 33/007 (2013.01); H01L 33/025 (2013.01); H01L 33/08 (2013.01); H01L 33/12 (2013.01); H01L 33/18 (2013.01); H01L 33/24 (2013.01); H01S 5/125 (2013.01); H01S 5/341 (2013.01)] | 26 Claims |

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1. A method for making a device, comprising:
forming a buffer layer on a silicon substrate;
forming a periodically doped layer on the buffer layer;
forming one or more nanowires on the periodically doped layer; and
introducing porosity into the periodically doped layer to form a porous distributed Bragg reflector (DBR).
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