| CPC H01L 33/06 (2013.01) [H01L 33/0025 (2013.01); H01L 33/30 (2013.01)] | 15 Claims |

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1. A semiconductor structure comprising:
a highly doped (n++) plasmonic epitaxial layer; and
a diode structure disposed above the n++ epitaxial layer,
wherein the diode structure is monolithically integrated with the highly doped (n++) plasmonic epitaxial layer in an all-epitaxial growth, and
wherein the highly doped (n++) plasmonic epitaxial layer is doped such that is optically metallic in a mid-IR range.
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