US 12,255,069 B2
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
Yukitomo Hirochi, Toyama (JP); Takashi Nogami, Toyama (JP); Norichika Yamagishi, Toyama (JP); and Yoshihiko Yanagisawa, Toyama (JP)
Assigned to Kokusai Electric Corporation, Tokyo (JP)
Filed by Kokusai Electric Corporation, Tokyo (JP)
Filed on Feb. 12, 2021, as Appl. No. 17/175,274.
Application 17/175,274 is a continuation of application No. PCT/JP2018/031197, filed on Aug. 23, 2018.
Prior Publication US 2021/0166945 A1, Jun. 3, 2021
Int. Cl. H05B 6/76 (2006.01); H01L 21/26 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01); H05B 6/68 (2006.01)
CPC H01L 21/268 (2013.01) [H01L 21/67115 (2013.01); H01L 21/67253 (2013.01); H05B 6/68 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a process housing comprising a process chamber in which a substrate is processed;
a transfer housing provided adjacent to the process housing and comprising a transfer chamber wherein the substrate is transferred between the process chamber and the transfer chamber;
a microwave generator configured to transmit a microwave to be supplied into the process chamber;
a loading/unloading port connecting between the process chamber and the transfer chamber and through which the substrate is transferred;
an opening/closing structure configured to open or close the loading/unloading port;
a plurality of detection sensors provided in the transfer chamber adjacent to the loading/unloading port and configured to detect the microwave leaking to the transfer chamber from the process chamber through the loading/unloading port while the opening/closing structure maintains the loading/unloading port closed; and
a controller configured to control the microwave generator to stop a transmission of the microwave when each time duration of the microwave being detected by two or more detection sensors among the plurality of detection sensors has reached a threshold time.