US 12,255,042 B2
Numerically compensating SEM-induced charging using diffusion-based model
Thomas Jarik Huisman, Eindhoven (NL); and Shakeeb Bin Hasan, Montreal (CA)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/636,344
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Aug. 15, 2020, PCT No. PCT/EP2020/072941
§ 371(c)(1), (2) Date Feb. 17, 2022,
PCT Pub. No. WO2021/032652, PCT Pub. Date Feb. 25, 2021.
Claims priority of application No. 19192198 (EP), filed on Aug. 19, 2019.
Prior Publication US 2022/0293389 A1, Sep. 15, 2022
Int. Cl. H01J 37/28 (2006.01); G06T 5/70 (2024.01); H01J 37/22 (2006.01)
CPC H01J 37/222 (2013.01) [G06T 5/70 (2024.01); H01J 37/28 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/24578 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for enhancing an image, the method comprising:
acquiring a scanning electron microscopy (SEM) image of a sample;
simulating a SEM-induced charging effect associated with a position of the SEM image, wherein the simulated SEM-induced charging effect comprises a simulated diffused charge accumulated on or near a surface of the sample induced by an electron beam scanning over the surface of the sample; and
providing an enhanced SEM image based on the SEM image and the simulated SEM-induced charging effect.