US 12,255,041 B2
Electron microscope and method of correcting aberration
Keito Aibara, Tokyo (JP); Tomohiro Nakamichi, Tokyo (JP); Shigeyuki Morishita, Tokyo (JP); Motofumi Saito, Tokyo (JP); Ryusuke Sagawa, Tokyo (JP); and Fuminori Uematsu, Tokyo (JP)
Assigned to JEOL Ltd., Tokyo (JP)
Filed by JEOL Ltd., Tokyo (JP)
Filed on Jul. 20, 2022, as Appl. No. 17/869,117.
Claims priority of application No. 2021-120564 (JP), filed on Jul. 21, 2021.
Prior Publication US 2023/0026970 A1, Jan. 26, 2023
Int. Cl. H01J 37/153 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/153 (2013.01) [H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2804 (2013.01)] 11 Claims
OG exemplary drawing
 
1. An electron microscope comprising:
an imaging unit configured to acquire a ronchigram generated as a result of illumination of an electron beam onto a sample;
a centering unit configured to control a centering process to match a ronchigram center with an imaging center based on the ronchigram acquired by the imaging unit;
an in-advance correction unit configured to control an in-advance correction of a particular aberration caused in an electron beam illumination system, based on a ronchigram acquired by the imaging unit after the centering process; and
a primary correction unit configured to control correction of a group of aberrations formed from a plurality of aberrations caused in the electron beam illumination system, based on a ronchigram acquired by the imaging unit after the in-advance correction of the particular aberration.