US 12,254,908 B2
System for controlling a critical dimension (CD) uniformity of a magnetic head device
Tom Zhong, Saratoga, CA (US); Hiroshi Omine, Santa Clara, CA (US); Jianing Zhou, Fremont, CA (US); Kunliang Zhang, Fremont, CA (US); Ruhang Ding, Pleasanton, CA (US); and Min Li, Fremont, CA (US)
Assigned to Headway Technologies, Inc., Milpitas, CA (US)
Filed by Headway Technologies, Inc., Milpitas, CA (US)
Filed on Jun. 28, 2023, as Appl. No. 18/215,679.
Application 18/215,679 is a continuation of application No. 17/364,300, filed on Jun. 30, 2021, granted, now 11,715,491.
Prior Publication US 2023/0343362 A1, Oct. 26, 2023
Int. Cl. G11B 5/127 (2006.01); G11B 5/31 (2006.01); G11B 5/48 (2006.01); H04R 31/00 (2006.01)
CPC G11B 5/484 (2013.01) [G11B 5/3163 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A system for controlling a critical dimension (CD) uniformity of a magnetic head device, the system comprising:
a film stack including:
a substrate;
a magnetoresistive (MR) sensor layer; and
a hard mask layer;
a first mask that defines critical shape patterns other than the CD, wherein the hard mask layer is patterned using the first mask; and
a second mask that defines the CD, wherein a mandrel pattern is formed on the hard mask layer using the second mask.