US 12,253,799 B2
High refractive index nano-imprint lithography resin
Chau Ha, Glen Ellyn, IL (US); and Martin Newcomb, Glen Ellyn, IL (US)
Assigned to Addison Clear Wave Coatings, Inc., St. Charles, IL (US)
Filed by Addison Clear Wave Coatings, Inc., St. Charles, IL (US)
Filed on Jan. 24, 2023, as Appl. No. 18/100,695.
Claims priority of provisional application 63/302,656, filed on Jan. 25, 2022.
Prior Publication US 2023/0236499 A1, Jul. 27, 2023
Int. Cl. G03F 7/20 (2006.01); C08K 3/22 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/0002 (2013.01) [C08K 3/22 (2013.01); C08K 2003/2241 (2013.01); C08K 2201/005 (2013.01); C08K 2201/011 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A photo nanoimprint lithography (P-NIL) resin comprising:
a cross-linkable organic binder;
solvent based inorganic nanoparticles dispersed in the P-NIL resin; and
a solvent configured to be evaporated;
the P-NIL resin having a viscosity in the range of 4,000 to 6,000 centipoise at 25° C. after the solvent is evaporated prior to curing the P-NIL resin; and
the P-NIL resin having a refractive index of greater than 1.6 at 589 nm and glass transition temperature of greater than 50° C. after curing by a photo initiator.