US 12,253,536 B2
Automatic analysis device and automatic analysis method
Yuto Kazama, Tokyo (JP); Masahiko Iijima, Tokyo (JP); and Sakuichiro Adachi, Tokyo (JP)
Assigned to HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Filed by HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Filed on Apr. 23, 2024, as Appl. No. 18/642,922.
Application 18/642,922 is a continuation of application No. 18/140,657, filed on Apr. 28, 2023, granted, now 11,971,425.
Application 18/140,657 is a continuation of application No. 17/197,155, filed on Mar. 10, 2021, granted, now 11,674,970, issued on Jun. 13, 2023.
Application 17/197,155 is a continuation of application No. 16/308,516, granted, now 10,976,333, issued on Apr. 13, 2021, previously published as PCT/JP2017/022334, filed on Jun. 16, 2017.
Claims priority of application No. 2016-141689 (JP), filed on Jul. 19, 2016.
Prior Publication US 2024/0272187 A1, Aug. 15, 2024
Int. Cl. G01N 1/00 (2006.01); G01N 21/27 (2006.01); G01N 21/78 (2006.01); G01N 35/04 (2006.01); G01N 35/10 (2006.01); G01N 35/00 (2006.01)
CPC G01N 35/04 (2013.01) [G01N 21/27 (2013.01); G01N 21/78 (2013.01); G01N 35/1002 (2013.01); G01N 35/1065 (2013.01); G01N 2035/00396 (2013.01); G01N 2035/00435 (2013.01); G01N 2035/00534 (2013.01); G01N 2035/0441 (2013.01); G01N 2035/0443 (2013.01); G01N 2035/0453 (2013.01); G01N 2035/0475 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An automatic analysis device comprising
an analysis control unit that controls an analysis of target specimen using a plurality of calibration curves of different quantitative ranges,
wherein the analysis control unit is configured to set a switching region in an overlap region of a quantitation range of each of the plurality of calibration curves, the switching region having a region width larger than a variation of a quantitation value of a target component based on measurement values of each of the calibration curves for the same specimen.