US 12,253,472 B2
System and method for detecting a defect in a specimen
Richard Paul Good, Saratoga Springs, NY (US); Roberto Schiwon, Dresden (DE); Matthias Ruhm, Dresden (DE); and Dirk Wollstein, Dresden (DE)
Assigned to GlobalFoundries U.S. Inc., Malta, NY (US)
Filed by GlobalFoundries U.S. Inc., Malta, NY (US)
Filed on Nov. 7, 2022, as Appl. No. 18/052,960.
Prior Publication US 2024/0151653 A1, May 9, 2024
Int. Cl. G01N 21/95 (2006.01); G01B 11/30 (2006.01)
CPC G01N 21/9501 (2013.01) [G01B 11/306 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A system for detecting a defect in a specimen comprising:
a lithography exposure tool including a measurement unit, the measurement unit is configured to obtain topography data of the specimen by illumination of a surface of the specimen with an optical signal; and
a processor configured to generate a statistical data from the topography data and produce a defect notification if the statistical data is outside of a control limit, wherein the generation of the statistical data from the topography data comprises a subtraction of the topography data of the specimen from a reference topography data to obtain a residual data, and a processing of the residual data using a high-pass filter to obtain a filtered data.