US 12,252,632 B2
Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method
Hiroshi Kitamura, Tsu (JP); Tsuyoshi Masuda, Tsu (JP); Yoshiyuki Matsumura, Nara (JP); Akihisa Namiki, Tsu (JP); and Takeshi Saito, Tsu (JP)
Assigned to ENTEGRIS, INC., Billerica, MA (US)
Appl. No. 17/620,181
Filed by CMC Materials KK, Aurora, IL (US)
PCT Filed Jun. 11, 2020, PCT No. PCT/JP2020/023089
§ 371(c)(1), (2) Date Dec. 17, 2021,
PCT Pub. No. WO2020/255862, PCT Pub. Date Dec. 24, 2020.
Claims priority of application No. 2019-112143 (JP), filed on Jun. 17, 2019.
Prior Publication US 2022/0372329 A1, Nov. 24, 2022
Int. Cl. C09G 1/02 (2006.01); C11D 1/62 (2006.01); H01L 21/306 (2006.01)
CPC C09G 1/02 (2013.01) [C11D 1/62 (2013.01); H01L 21/30625 (2013.01)] 22 Claims
 
1. A chemical-mechanical polishing composition, comprising:
an abrasive,
a basic component,
at least one compound selected from the group consisting of a quaternary polyammonium salt, and a quaternary ammonium salt having 6 or more carbon atoms, and
an aqueous carrier,
wherein the quaternary ammonium salt having 6 or more carbon atoms has following general formula (2):

OG Complex Work Unit Chemistry
wherein R7, R8 and R9 are independently a substituted or unsubstituted, linear or branched alkyl group having 1 to 6 carbon atoms, or a benzyl group, R10 is a substituted or unsubstituted, linear or branched alkyl group having 7 to 30 carbon atoms, and Y— is a counterion, or
a cation moiety selected from the group consisting of a methyltriethylammonium ion, a methyltripropylammonium ion, a methyltributylammonium ion, a methyltripentylammonium ion, a methyltrihexylammonium ion, an ethyltripropylammonium ion, an ethyltributylammonium ion, an ethyltripentylammonium ion, an ethyltrihexylammonium ion, a diethyldimethylammonium ion, a propyltrimethylammonium ion, a propyltriethylammonium ion, a propyltributylammonium ion, a propyltripentylammonium ion, a propyltrihexylammonium ion, a dipropyldimethylammonium ion, a dipropyldiethylammonium ion, a butyltrimethylammonium ion, a butyltriethylammonium ion, a butyltripropylammonium ion, a butyltripentylammonium ion, a butyltrihexylammonium ion, a dibutyldimethylammonium ion, a dibutyldiethylammonium ion, a dibutyldipropylammonium ion, a pentyltrimethylammonium ion, a pentyltriethylammonium ion, a pentyltripropylammonium ion, a pentyltributylammonium ion, a pentyltrihexylammonium ion, a dipentyldimethylammonium ion, a dipentyldiethylammonium ion, a dipentyldipropylammonium ion, a dipentyldibutylammonium ion, a hexyltrimethylammonium ion, a hexyltriethylammonium ion, a hexyltripropylammonium ion, a hexyltributylammonium ion, a hexyltripentylammonium ion, a dihexyldimethylammonium ion, a dihexyldiethylammonium ion, a dihexyldipropylammonium ion, a dihexyldibutylammonium ion, a dihexyldipentylammonium ion, a benzylethyldimethylammonium ion, a benzyltriethylammonium ion, a benzyltripropylammonium ion, a benzyltributylammonium ion, a benzyltripentylammonium ion, and a benzyltrihexylammonium ion, and
wherein the chemical-mechanical polishing composition has a pH of 7 to 12.