US 12,252,500 B2
Production method for organic silicon compound having ketimine structure
Shigeki Yasuda, Annaka (JP); and Munenao Hirokami, Annaka (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Appl. No. 17/051,970
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
PCT Filed Oct. 10, 2018, PCT No. PCT/JP2018/037712
§ 371(c)(1), (2) Date Oct. 30, 2020,
PCT Pub. No. WO2019/211921, PCT Pub. Date Nov. 7, 2019.
Claims priority of application No. 2018-088059 (JP), filed on May 1, 2018.
Prior Publication US 2021/0238206 A1, Aug. 5, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C07F 7/18 (2006.01); C07F 7/08 (2006.01); C07F 7/20 (2006.01)
CPC C07F 7/1892 (2013.01) [C07F 7/081 (2013.01); C07F 7/20 (2013.01)] 17 Claims
 
1. A method for preparing an organosilicon compound having a ketimine structure, represented by the following formula (1):

OG Complex Work Unit Chemistry
wherein R1 is each independently a C1-C10 alkyl or C6-C10 aryl group, R2 is each independently a C1-C10 alkyl or C6-C10 aryl group, R3 and R4 are each independently hydrogen or a C1-C10 alkyl or C6-C10 aryl group, n is an integer of 1 to 3, and m is an integer of 1 to 12, said method comprising the steps of:
(I) reacting an amino-containing organosilicon compound having the following formula (2) with a carbonyl compound having the following formula (3):

OG Complex Work Unit Chemistry
wherein R1, R2, R3, R4, n, and m are as defined above, and
(II) reducing a chlorine content,
the chlorine content being reduced to less than 0.1 ppm by weight based on the organosilicon compound having formula (1), wherein step (II) of reducing a chlorine content includes using an inorganic adsorbent being hydrotalcite.