US 12,251,944 B2
Meniscus measuring apparatus and method, substrate processing apparatus
Han Lim Kang, Seoul (KR); Suk Won Jang, Gyeonggi-do (KR); Jae Duck Lee, Gyeonggi-do (KR); and Won Yong Jin, Jeollabuk-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Aug. 11, 2022, as Appl. No. 17/885,552.
Claims priority of application No. 10-2021-0111858 (KR), filed on Aug. 24, 2021.
Prior Publication US 2023/0063647 A1, Mar. 2, 2023
Int. Cl. B41J 2/21 (2006.01); G01B 11/24 (2006.01)
CPC B41J 2/2139 (2013.01) [G01B 11/24 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for measuring a meniscus comprising:
providing a head unit capable of discharging ink through a plurality of nozzles;
adhering ink that is left over in the plurality of nozzles after a previous completed discharge by the head unit to a film to form a detection pattern on the film by bringing the film into close contact with the plurality of nozzles, the adhering being performed without an active discharge of the ink that is left over by the head unit when the film is brought into the close contact with the plurality of nozzles; and
measuring a meniscus of the ink that is left over in the plurality of nozzles after the previous completed discharge by the head unit based on the detection pattern.