CPC B32B 7/06 (2013.01) [B32B 17/10 (2013.01); B32B 2264/10 (2013.01)] | 20 Claims |
1. A laminate structure used in the manufacturing of electronics devices, the laminate structure comprising:
a rigid substrate;
a flexible microelectronics structure comprising:
at least one device layer; and
at least one flexible device substrate layer;
a debonding structure provided between the rigid substrate and the flexible microelectronics structure, the debonding structure comprising:
at least one debonding layer made of a non-metallic inorganic material,
the laminate structure comprising first and second peeling surfaces, at least one of the peeling surfaces corresponding to a surface of the debonding structure or to a surface within the debonding structure, the first and second peeling surfaces being peelable by a debonding force resulting from pressurized fluid delamination and/or from mechanical delamination applied during an initiation phase followed by a delamination phase, whereby:
the initiation phase comprises a debonding force of more than 40 gF, and the delamination phase comprises a debonding force of less than 30 gF, thereby allowing separating the flexible microelectronic device from the rigid substrate.
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