US 11,930,585 B2
Material synthesis technology by microwave plasma torch with atmospheric pressure and high temperature
Ye Bai, Chengdu (CN); and Dashuai Li, Chengdu (CN)
Assigned to Chengdu Landmarks Technology Co., Ltd, Chengdu (CN)
Filed by Ye Bai, Chengdu (CN); and Dashuai Li, Chengdu (CN)
Filed on Jun. 23, 2021, as Appl. No. 17/355,259.
Prior Publication US 2022/0007488 A1, Jan. 6, 2022
Int. Cl. H05H 1/30 (2006.01); H05H 1/03 (2006.01)
CPC H05H 1/30 (2013.01) [H05H 1/03 (2013.01)] 1 Claim
OG exemplary drawing
 
1. A technology of material synthesis by microwave plasma torch, the technology comprising:
a plasma torch system with atmosphere pressure and high temperature and a material growth system;
the plasma torch system with atmosphere pressure and high temperature comprises a high-power microwave source and a coupling transmission system and a plasma torch generator;
the plasma torch generator comprising:
a length of cylindrical metal tube and an igniting and control electrode;
wherein, the technology is configured such that:
at the system start-up, an igniting and control electrode is close to an output-end of the cylindrical metal tube and a cutting-edge breakdown happens due to inputting high-power microwave;
the cutting-edge breakdown ignites the plasma torch at the output-end of the cylindrical metal tube generates under the effect of the high-power microwave; and
the igniting and control electrode moves away and place in a material growth space;
the material growth system comprises a seal, a heater and a material growth control system;
the seal maintains a space with a length of a quartz tube, two flanges with a water-cool jacket and two plates;
the output-end of the cylindrical metal tube and the igniting and control electrode are placed inside the seal;
the heater heats the material growth space;
the material growth control system comprises a metal ring, an adjustable direct current (DC) source, an igniting and control electrode;
the metal ring is on the outside wall of the quartz tube, connected to the DC source with the electrode;
wherein, the technology is configured such that:
an adjustable static electrical field in the space between the plasma torch and material growth space affects an active particle beam; and
the adjustable static electrical field controls the motion of the active particle, and the ingredients proportion of negative and positive ions or particles in the active particle beam; and
a material growth can be controlled by the adjustable static electrical field.