US 11,927,701 B2
Techniques for scan pattern beam alignment
Keith Gagne, Santa Clara, CA (US); and Bradley Scot Levin, San Jose, CA (US)
Assigned to Aeva, Inc., Mountain View, CA (US)
Filed by AEVA, INC., Mountain View, CA (US)
Filed on Jun. 13, 2022, as Appl. No. 17/839,311.
Application 17/839,311 is a continuation of application No. 17/485,838, filed on Sep. 27, 2021, granted, now 11,360,198.
Prior Publication US 2023/0100452 A1, Mar. 30, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G01S 7/48 (2006.01); G01S 7/481 (2006.01); G01S 7/497 (2006.01); G01S 17/42 (2006.01)
CPC G01S 7/4972 (2013.01) [G01S 7/4816 (2013.01); G01S 7/4817 (2013.01); G01S 17/42 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An optical scanning system, comprising:
a first optical source to generate a first optical beam transmitted towards an output lens;
a second optical source to generate a second optical beam transmitted towards the output lens, wherein the first optical beam and the second optical beam generate a first output beam pattern;
a light detection sensor to detect a second output beam pattern at an image plane, wherein the second output beam pattern comprises a shift in the first or second optical beam from the first output beam pattern;
alignment optics disposed between the light detection sensor and the first optical source and the second optical source, the alignment optics comprising one or more optical components adjustable to shift the first and second optical beams at the image plane to align with the first output beam pattern.