CPC F28D 15/0283 (2013.01) [F28D 15/0233 (2013.01); F28D 15/046 (2013.01); F28F 3/12 (2013.01); H05K 7/20309 (2013.01); F28F 2240/00 (2013.01)] | 21 Claims |
1. A method for fabricating a vapor chamber, comprising:
positioning a capillary structure on a first cover;
forming an accommodation space, a flow channel, and a plurality of posts on a first surface of a second cover;
covering the first cover with the second cover;
positioning the first cover and the second cover such that the plurality of posts are spaced apart from the capillary structure by a distance; and
pressure welding the first cover and the second cover so as to form a chamber between the first cover and second cover and a passage connected to the chamber and to pressure weld the plurality of posts with the capillary structure.
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