US 11,926,017 B2
Method and apparatus for cleaning process monitoring
Charlie Wang, Hsinchu (TW); Yu-Ping Tseng, Taipei (TW); Y. J. Chen, Taoyuan (TW); Wai-Ming Yeung, Hsinchu (TW); Chien-Shen Chen, Hsinchu (TW); Danny Kuo, Taipei (TW); Yu-Hsuan Hsieh, New Taipei (TW); and Hsuan Lo, New Taipei (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on May 5, 2021, as Appl. No. 17/308,767.
Application 17/308,767 is a division of application No. 15/940,749, filed on Mar. 29, 2018, granted, now 11,007,620.
Claims priority of provisional application 62/585,746, filed on Nov. 14, 2017.
Prior Publication US 2021/0252668 A1, Aug. 19, 2021
Int. Cl. B08B 3/14 (2006.01); B08B 1/00 (2006.01); B08B 3/00 (2006.01); B24B 37/013 (2012.01); B24B 53/017 (2012.01); C02F 1/00 (2023.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01)
CPC B24B 53/017 (2013.01) [B08B 1/002 (2013.01); B08B 3/00 (2013.01); B08B 3/14 (2013.01); B24B 37/013 (2013.01); C02F 1/00 (2013.01); H01L 21/02052 (2013.01); H01L 21/02074 (2013.01); H01L 21/67028 (2013.01); H01L 21/67253 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A cleaning process monitoring system, comprising:
a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution, wherein the cleaning solution comprises a directional and focused stream of gaseous carbon dioxide (CO2);
a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process, wherein the particle detector comprises a plurality of channels having different sizes from one another, wherein each of the plurality of channels is configured for detecting particles of respective different sizes;
a pump coupled to the cleaning container through the outlet and configured to provide suction to draw the waste solution through the cleaning system; and
a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to control the cleaning system.