| CPC H10B 20/25 (2023.02) [G11C 17/16 (2013.01); H01L 23/5252 (2013.01)] | 18 Claims |

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1. A one-time programmable memory cell, comprising:
a selection transistor and a gate capacitor, which are connected in series and located in a substrate, the substrate comprising an active region and an isolation region;
wherein the gate capacitor comprises:
a gate,
a gate oxide layer between the gate and the substrate, and
an ion-doped region beneath the gate oxide layer, the ion-doped region being located in the active region in the substrate and overlapping with a part of a lower surface of the gate oxide layer;
wherein a part of the lower surface of the gate oxide layer that does not overlap with the ion-doped region completely overlaps with the isolation region in the substrate, and the ion-doped region and the isolation region are seamlessly adjacent to each other in the substrate beneath the gate oxide layer.
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