US 12,250,762 B2
Light source apparatus
Yusuke Teramoto, Tokyo (JP)
Assigned to Ushio Denki Kabushiki Kaisha, Tokyo (JP)
Filed by Ushio Denki Kabushiki Kaisha, Tokyo (JP)
Filed on Nov. 15, 2022, as Appl. No. 17/987,145.
Claims priority of application No. 2022-057607 (JP), filed on Mar. 30, 2022.
Prior Publication US 2023/0317396 A1, Oct. 5, 2023
Int. Cl. H05G 2/00 (2006.01)
CPC H05G 2/0027 (2024.08) [H05G 2/0023 (2024.08); H05G 2/008 (2013.01)] 16 Claims
OG exemplary drawing
 
1. An x-ray or extreme ultraviolet light source apparatus, in which an electron beam or laser beam transforms a liquid raw material into plasma to extract x-ray or extreme ultraviolet radiation, the x-ray or extreme ultraviolet light source apparatus comprising:
a beam source for emitting an electron beam or laser beam;
a rotation body having a main surface perpendicular to a rotational axis and disposed at a position onto which the electron beam or laser beam is incident, and includes a V-shaped groove located in the main surface and overlapping with an incident area of the electron beam or laser beam;
a raw material supply section that supplies the groove with the liquid raw material; and
a layer thickness adjustment section configured to adjust a layer thickness of the liquid raw material such that a front surface of the liquid raw material forms a concave surface in response to the V-shaped groove in the incident area of the electron beam or laser beam.