| CPC H01L 27/0266 (2013.01) [H01L 27/0629 (2013.01); H02H 9/046 (2013.01); H01L 28/20 (2013.01); H01L 29/78 (2013.01); H01L 29/80 (2013.01)] | 16 Claims | 

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               12. A method of forming an integrated circuit comprising: 
            providing a metal-oxide-semiconductor field-effect transistor (MOSFET) extending into a semiconductor substrate, the MOSFET having a drain coupled to a protected node, a gate, and a source coupled to a circuit ground; 
                electrically connecting a first current handling terminal of a junction field-effect transistor (JFET) directly to the drain of the MOSFET, electrically connecting a second current handling terminal of the JFET to the gate of the MOSFET, and electrically coupling a control terminal of the JFET to a reference potential, wherein the JFET is configured to be on when a first voltage on the control terminal of the JFET is less than a second voltage on the first current handling terminal of the JFET; and 
                electrically connecting the second current handling terminal of the JFET is to a first terminal of a resistor, and electrically connecting a second terminal of the resistor to the circuit ground. 
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